Corrosion Resistivity of Vapor Deposited Titanium Carbide at High Temperatures

A Review on Titanium Nitride and Titanium Carbide Single and Multilayer Coatings Deposited by Plasma Assisted Chemical Vapor Deposition

In this paper, we reviewed researches about the titanium nitride (TiN) and titanium carbide (TiC) single and multilayer coatings. These coatings were deposited by the plasma assisted chemical vapor deposition (PACVD) technique. Plasma-based technologies are used for the processing of thin films and coatings for different applications such as automobile and aerospace parts, computer disc drives,...

Density and index of refraction of water ice films vapor deposited at low temperatures

The density of 0.5–3 mm thick vapor-deposited films of water ice were measured by combined optical interferometry and microbalance techniques during deposition on an optically flat gold substrate from a capillary array gas source. The films were of high optical quality with an index of refraction of 1.2960.01 at 435.8 nm, a density of 0.8260.01 g/cm, and a porosity of 0.1360.01. In contrast to ...

Changes in Resistivity and Composition of Chemical Vapor Deposited Tungsten Silicide Films by Annealing

Chemical vapor deposited (CVD) tungsten silicide films were formed by a cold wall reactor. These films were annealed in N2 to investigate changes in resistivity, composition, thickness, and impurity. The change in resistivity after 1000~ annealing becomes larger as the film reaches the stoichiometric value. A composition change occurs in a film whose composit ion Si/W is more than 2.6. Excess S...

Micromechanical properties of silicon-carbide thin films deposited using single-source chemical-vapor deposition

1,3-Disilabutane is used as a single-source precursor to deposit conformal silicon-carbide films on silicon atomic-force-microscopy cantilevers. By measuring the resonance frequency of the cantilever as a function of silicon-carbide film thickness and developing an appropriate model, the value of the film’s elastic modulus is determined. This value is in good agreement with those reported for s...

Production of Titanium Carbide via Mechanochemical Process